Everchase Industrial Ltd
Chemical supply since 1988
 
AsahiKASEI
 
SUNFORT Dry Film Photoresist YQ-40PT features include:
Wider latitude of exposing and developing conditions.

High resolution and excellent reproducibility of photomask after developing.

Excellent imaging contrast

Unexposed colour: Green
Exposed colour: Dark Blue

Polymerized resist is tough and has a good etching resistance to etchants such as:

Ferrie Chloride (FeCl3)
Cupric Chloride (CuCl2)
Ammonium Persulfate (NH4S2O8)

Polymerized resist remains firmly bonded to copper surface, and has an excellent chemical resistance to acidic electroplating baths such as:

Copper Sulfate
Solder Fluoborate

Acidic Cleaners, ammonium perdulfate and dilute sulfaric acid can be used in preplate cleaning.

During stripping, polymerized resist breaks up into small articles and is not soluble in a stripping solution

SUNFORT is a polyacrylic-based dry film photoresist for printed circuit board production, ultilizing alkaline-solution development. SUNFORT grades and types are developed and designed to meet the broad-ranging, advanced requirements for production of higher performance, higher value-added printed circuit boards.
 
Process
Conditions
Lamination
Board temperature
50oC
Laminating roll temp
105oC
Roll pressure
3.5 kg / cm2
Laminating speed
1.5 m / min
Holding Time
 
30 min
Exposure
 
40-120 mj / cm2
Holding Time
 
30 min
Development
Developing solution
1.0wt%Na2Co3
Developing temp
30oC
Spray pressure
1.5kg/cm2
Developing time
55sec(B.P. = 35sec)
Stripping
Stripping solution
3.0wt%NaoH
Stripping temp
50oC
Spray pressure
2.0kg/cm2
Stripping time
55sec(L.P.=35sec)
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