|Wider latitude of exposing and developing conditions.
High resolution and excellent reproducibility of photomask after developing.
Excellent imaging contrast
Unexposed colour: Green
Exposed colour: Dark Blue
Polymerized resist is tough and has a good etching resistance to etchants such as:
Ferrie Chloride (FeCl3)
Cupric Chloride (CuCl2)
Ammonium Persulfate (NH4S2O8)
Polymerized resist remains firmly bonded to copper surface, and has an excellent chemical resistance to acidic electroplating baths such as:
Acidic Cleaners, ammonium perdulfate and dilute sulfaric acid can be used in preplate cleaning.
During stripping, polymerized resist breaks up into small articles and is not soluble in a stripping solution